Plasma-Therm Technical Workshop: Fundamentals of Plasma Processing (Etching and Deposition)
David Lishan, Ph.D.
Principal Scientist and Director in Technical Marketing, Plasma-Therm
DEIB - Conference Room
April 14th, 2016
8.30am to 5.00pm
Contact:
Andrea Melloni
Claudio Somaschini
Research Line:
Applied electromagnetics
Principal Scientist and Director in Technical Marketing, Plasma-Therm
DEIB - Conference Room
April 14th, 2016
8.30am to 5.00pm
Contact:
Andrea Melloni
Claudio Somaschini
Research Line:
Applied electromagnetics
Abstract
The workshop will focus on the fundamentals of plasma etching and deposition. Lectures will include the basics of plasma reactors and mechanisms for etching and deposition and review state-of-the-art etching and deposition technologies as applied to semiconductors, MEMS, and nanofabrication. Talks will cover compound semiconductor, dielectric, and deep silicon etching as well as PECVD and high density plasma CVD of silicon based materials. Fundamental and new ideas for endpoint detection and sample thermal budget management will be presented.
Event is free. Pre-registration requested before April 12th, 2016.
For general and registration enquiries, please contact:
Assing S.p.A. mail: strumenti@assing.it; tel.: +390281881811
Polifab www.polifab.polimi.it/
Event is free. Pre-registration requested before April 12th, 2016.
For general and registration enquiries, please contact:
Assing S.p.A. mail: strumenti@assing.it; tel.: +390281881811
Polifab www.polifab.polimi.it/
Short Bio
After receiving his undergraduate degree in Chemistry from UC Santa Cruz and Ph.D. from UC Santa Barbara in Solid State Electrical Engineering he has worked and published on a wide range of material, semiconductor, and chemistry R&D projects in the areas of lithography, photochemistry, x-ray mask fabrication, PVD, and plasma processing. During his 17 years at Plasma-Therm, he has had business unit management and worldwide marketing responsibilities as well as managing the development of recently released plasma dicing product. Currently he is in the roles of Principal Scientist and Director in Technical Marketing, and recently organized and presented plasma processing workshops at leading institutions throughout the world. His primary focus is on the application of plasma processing for R&D, MEMS, photonics, data storage, power, and compound semiconductor applications. He holds two patents in the area of semiconductor processing and has over 60 publications and conference presentations.
With Plasma-Therm, he has organized and presented plasma processing workshops at leading institutions throughout the world, including Harvard University, UC Berkeley, University of Notre Dame, UC Los Angeles (UCLA), University of South Florida, Stanford University, Lund University (Sweden), IMRE (Singapore), UC Santa Barbara (UCSB), ISCAS (Beijing, China), SINANO (Suzhou, China), Shanghai Jiao Tong University, UT Austin, Cornell University, Pennsylvania State University, KANC (S. Korea), University of Alberta, Weizmann Institute, University of Queensland, University of New South Wales, and in Israel.
With Plasma-Therm, he has organized and presented plasma processing workshops at leading institutions throughout the world, including Harvard University, UC Berkeley, University of Notre Dame, UC Los Angeles (UCLA), University of South Florida, Stanford University, Lund University (Sweden), IMRE (Singapore), UC Santa Barbara (UCSB), ISCAS (Beijing, China), SINANO (Suzhou, China), Shanghai Jiao Tong University, UT Austin, Cornell University, Pennsylvania State University, KANC (S. Korea), University of Alberta, Weizmann Institute, University of Queensland, University of New South Wales, and in Israel.